SCI-Expanded
JCR Q3
Özgün Makale
Scopus
On the possible conduction mechanisms in Rhenium/n-GaAs Schottky barrier diodes fabricated by pulsed laser deposition in temperature range of 60\u2013400 K
Journal of Materials Science: Materials in Electronics
2019
Cilt 30
Sayı 9
Scopus Eşleşmesi Bulundu
28
Atıf
30
Cilt
9029-9037
Sayfa
Scopus Yazarları: Haziret Durmuş, Mert Yıldırım, Şemsettin Altındal
Özet
This study presents electrical characteristics of n-GaAs based Schottky barrier diodes (SBDs) with Rhenium (Re) rectifier contacts. The electrical characteristics of the Re/n-GaAs SBDs were investigated utilizing the forward bias current-voltage (IF-VF) data collected in temperature range of 60-400 K. The values of ideality factor (n) and zero-bias barrier height (ΦBo) were found as 9.10 and 0.11 eV for 60 K, and 1.384 and 0.624 eV for 400 K, respectively, on the basis of thermionic-emission theory. The conventional Richardson plot deviated from linearity at low temperatures and the Richardson constant value (A*) was obtained quite lower than the theoretical value for this semiconductor (8.16 A cm-2 K-2). nkT/q-kT/q plot shows that the field-emission may be dominant mechanism at low temperatures as a result of tunneling via surface states since the studied n-GaAs’s doping concentration is on the order of 1018 cm-3, i.e. at high values so leads to tunneling. On the other hand, ΦBo-n, ΦBo-q/2kT and (n-1-1)-q/2kT plots exhibit linearity but this linearity is observed for two temperature regions (60-160 K and 180-400 K) due the presence of double Gaussian distribution (GD) of the barrier height. Therefore, the standard deviation value was obtained from the plot of ΦBo-q/2kT and it was used for modifying the conventional Richardson plot into the modified Richardson plot by which the values of mean barrier height and A* were obtained as 0.386 eV and 15.55 A cm-2 K-2 and 0.878 eV and 8.35 A cm-2 K-2 for the low and high temperature regions, respectively. As a result, IF-VF-T characteristics of the Re/n-GaAs SBDs were successfully elucidated by double-GD of barrier height.
Scimago Dergi Bilgisi
Otomatik ISSN Eşleştirmesi
2019 yılı verileri
Journal of Materials Science: Materials in Electronics
Q2
SJR Quartile
0,477
SJR Skoru
106
H-Index
Kategoriler: Atomic and Molecular Physics, and Optics (Q2) · Condensed Matter Physics (Q2) · Electrical and Electronic Engineering (Q2) · Electronic, Optical and Magnetic Materials (Q2) · Bioengineering (Q3) · Biomaterials (Q3) · Biomedical Engineering (Q3) · Biophysics (Q3)
Alanlar: Biochemistry, Genetics and Molecular Biology · Chemical Engineering · Engineering · Materials Science · Physics and Astronomy
Ülke: United States
· Springer New York
Bu bilgiler makale yılına göre Scimago veritabanından ISSN eşleştirmesiyle otomatik getirilmektedir.
Dergi sıralama verileri Scimago'nun ilgili yılı baz alınmaktadır.
Makale Bilgileri
Dergi
Journal of Materials Science: Materials in Electronics
ISSN
0957-4522
Yıl
2019
/ 1. ay
Cilt / Sayı
30
/ 9
Makale Türü
Özgün Makale
Hakemlik
Hakemli
Endeks
SCI-Expanded
JCR Quartile
Q3
TEŞV Puanı
27,00
Yayın Dili
Türkçe
Kapsam
Uluslararası
Toplam Yazar
3 kişi
Erişim Türü
Basılı
Alan
Fen Bilimleri ve Matematik Temel Alanı
Fizik
YÖKSİS Yazar Kaydı
Yazar Adı
DURMUŞ HAZİRET, YILDIRIM MERT, ALTINDAL ŞEMSETTİN
YÖKSİS ID
6080650
Hızlı Erişim
Metrikler
Scopus Atıf
28
JCR Quartile
Q3
TEŞV Puanı
27,00
Yazar Sayısı
3