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Amplifying main physical characteristics of CuO films using ascorbic acid as the reducer and stabilizer agent

Applied Physics A: Materials Science and Processing · Aralık 2021

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YÖKSİS Kayıtları
Amplifying main physical characteristics of CuO films using ascorbic acid as the reducer and stabilizer agent
Applied Physics A · 2021 SCI-Expanded
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Makale Bilgileri

DergiApplied Physics A: Materials Science and Processing
Yayın TarihiAralık 2021
Cilt / Sayfa127
DOI10.1007/s00339-021-05078-4
Scopus ID2-s2.0-85119329416
Özet Copper oxide thin films have been grown by successive ionic layer adsorption and reaction technique, which is inexpensive, environmentally friendly and simple onto soda-lime glass substrates from an aqueous copper (II) chloride dehydrate solution with and without the addition of ascorbic acid (AA) at 70 °C. Surface morphology, crystalline structure, chemical compositions, optical and electrical properties of thin films were investigated with a focus on the influences of different concentrations of AA. The analysis exhibited that the main physical performances of the CuO films were found to change with AA content. Estimated crystallite sizes decreased from 24.64 to 12.78 nm with the addition of AA in the growth bath solutions. The optical bandgap energy of CuO is found to increase from 1.42 to 1.55 eV as a consequence of the increasing AA content. As the AA concentration in the solution bath increases the transmittance increases from ≈ 5 to ≈28%. FTIR transmittance spectra of CuO have a characteristic stretching vibration mode of the metal–oxide bonds and the addition of AA caused the appearance of many peaks of this molecule. Contact resistance values decreased with the AA content from 0.657 × 109 to 0.342 × 109 Ω. It is worth noting that the deposition technique is low cost and very simple; obtained CuO thin films could be appropriate for different technological applications.

Yazarlar (4)

1
Abdullah Akkaya
2
Osman Kahveci
3
R. Aydin
4
B. Sahin

Anahtar Kelimeler

Ascorbic acid Bandgap CuO film Electrical conductivity FT-IR XRD

Kurumlar

Erciyes Üniversitesi
Kayseri Turkey
Kırşehir Ahi Evran Üniversitesi
Kirsehir Turkey
Mustafa Kemal Üniversitesi
Antakya Turkey
Selçuk Üniversitesi
Selçuklu Turkey

Metrikler

15
Atıf
4
Yazar
6
Anahtar Kelime

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RA
RAŞİT AYDIN
PROFESÖR

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